R. J. Jaccodine: search on Z-Library

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1

Self-assembly formed oxime monolayers on a copper surface

T. Diem, W. Fabianowski, R. Jaccodine, R. Rodowski

Journal:

Thin Solid Films

Year:

1995

Language:

english

File:

PDF, 296 KB

english, 1995

2

Observations of Spiral Growth Steps in Ethylene Polymer

JACCODINE, RALPH

Journal:

Year:

1955

File:

PDF, 251 KB

1955

3

Crystal Growth in Paraffin

JACCODINE, R. J.

Journal:

Year:

1960

File:

PDF, 385 KB

1960

4

Surface Energy of Germanium and Silicon

Jaccodine, R. J.

Journal:

Journal of The Electrochemical Society

Year:

1963

Language:

english

File:

PDF, 426 KB

english, 1963

5

Electron spin resonance study of the effect of applied stress during thermal oxidation of (1 1 1)Si on inherent Pb interface defects

D. Pierreux, A. Stesmans, R.J. Jaccodine, M.-T. Lin, T.J. Delph

Journal:

Microelectronic Engineering

Year:

2004

Language:

english

File:

PDF, 189 KB

english, 2004

6

Study of Devitrification of Lithium Glass

R. J. JACCODINE

Journal:

Journal of the American Ceramic Society

Year:

1961

Language:

english

File:

PDF, 478 KB

english, 1961

7

Whisker Growth from Quartz

JACCODINE, R. J., KLINE, R. K.

Journal:

Year:

1961

File:

PDF, 189 KB

1961

8

Coupling monolayers for protection of microelectronic circuits

Wojciech Fabianowski, Ralph Jaccodine, Ramesh Kodnani, Raymond Pearson, Piotr Smektala

Journal:

Advanced Functional Materials

Year:

1995

Language:

english

File:

PDF, 888 KB

english, 1995

9

A deep level transient spectroscopy study of rapid thermal annealed arsenic implanted silicon

S. E. Beck, R. J. Jaccodine, C. Clark

Journal:

Journal of Electronic Materials

Year:

1992

Language:

english

File:

PDF, 357 KB

english, 1992

10

The microelectronics packaging program at Lehigh University

Ralph J. Jaccodine

Journal:

JOM Journal of the Minerals, Metals and Materials Society

Year:

1991

File:

PDF, 828 KB

1991

11

Ion beam characterization of the ion implanted arsenic tail in silicon

S.E. Beck, R.J. Jaccodine, A.J. Filo, F.A. Stevie, R.B. Irwin, P.M. Kahora

Journal:

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Year:

1990

Language:

english

File:

PDF, 325 KB

english, 1990

12

An analytical model of diffusion current in intrinsically gettered structures based on intentional contamination experiments

Pearce, C.W., Jaccodine, R.J.

Journal:

IEEE Transactions on Electron Devices

Year:

1991

Language:

english

File:

PDF, 500 KB

english, 1991

13

Time lag and permeation in multilayer polymer coatings

Saikumar, V., Jaccodine, R.J.

Journal:

IEEE Transactions on Components Hybrids and Manufacturing Technology

Year:

1993

Language:

english

File:

PDF, 592 KB

english, 1993

14

Vectorial Photoelectric Effect in Clean Molybdenum

JUENKER, D. W., WALDRON, J. P., JACCODINE, R. J.

Journal:

Journal of the Optical Society of America

Year:

1964

Language:

english

File:

PDF, 1.70 MB

english, 1964

15

Precipitates Formed by High‐Concentration Phosphorus Diffusion in Silicon

Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1968

Language:

english

File:

PDF, 635 KB

english, 1968

16

Observation of tip-induced gap states in lightly doped Si(100) using scanning tunneling spectroscopy

Lin, Hai-An, Jaccodine, Ralph J., Freund, Michael S.

Journal:

Applied Physics Letters

Year:

1999

Language:

english

File:

PDF, 351 KB

english, 1999

17

Chemically enhanced thermal oxidation of silicon

Schmidt, P.F., Jaccodine, R.J., Wolowodiuk, C.H., Kook, T.

Journal:

Materials Letters

Year:

1985

Language:

english

File:

PDF, 342 KB

english, 1985

18

Fluorine-enhanced oxidation of polycrystalline silicon and application to thin-film transistor fabrication

Kouvatsos, Dimitrios N., Hatalis, Miltiadis K., Jaccodine, Ralph J.

Journal:

Applied Physics Letters

Year:

1992

Language:

english

File:

PDF, 606 KB

english, 1992

19

Influence of in situ applied stress during thermal oxidation of (111)Si on P[sub b] interface defects

Stesmans, A., Pierreux, D., Jaccodine, R. J., Lin, M.-T., Delph, T. J.

Journal:

Applied Physics Letters

Year:

2003

Language:

english

File:

PDF, 306 KB

english, 2003

20

Reduction of transient-enhanced diffusion of boron in silicon by implantation through oxide

Fan, D., Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1989

Language:

english

File:

PDF, 533 KB

english, 1989

21

Reverse annealing and low-temperature diffusion of boron in boron-implanted silicon

Huang, J., Fan, D., Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1988

Language:

english

File:

PDF, 848 KB

english, 1988

22

Measurement of Strains at Si-SiO2 Interface

Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1966

Language:

english

File:

PDF, 691 KB

english, 1966

23

A diffusional model for the oxidation behavior of Si[sub 1−x]Ge[sub x] alloys

Kilpatrick, S. J., Jaccodine, R. J., Thompson, P. E.

Journal:

Journal of Applied Physics

Year:

1997

Language:

english

File:

PDF, 437 KB

english, 1997

24

Experimental study of the oxidation of silicon germanium alloys

Kilpatrick, S. J., Jaccodine, R. J., Thompson, P. E.

Journal:

Journal of Applied Physics

Year:

2003

Language:

english

File:

PDF, 328 KB

english, 2003

25

AN EXPERIMENT ON THE EFFECT OF FIELDS ON DIFFUSION

Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1967

Language:

english

File:

PDF, 543 KB

english, 1967

26

Effect of fluorine on the diffusion of through-oxide implanted boron in silicon

Fan, D., Parks, J. M., Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1991

Language:

english

File:

PDF, 602 KB

english, 1991

27

Fast shrinkage of oxidation stacking faults during O2/NF3 oxidation of silicon

Kim, U. S., Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1986

Language:

english

File:

PDF, 440 KB

english, 1986

28

Improvement of the SiO2/Si interface of metal-oxide-semiconductor devices using gate dielectrics formed by NF3-aided oxidation and N2O post-annealing

Huang, Jenn Gwo, Jaccodine, Ralph J., Young, Donald R.

Journal:

Journal of Applied Physics

Year:

1994

Language:

english

File:

PDF, 1.05 MB

english, 1994

29

Silicon-fluorine bonding and fluorine profiling in SiO2 films grown by NF3-enhanced oxidation

Kouvatsos, D., McCluskey, F. P., Jaccodine, R. J., Stevie, F. A.

Journal:

Applied Physics Letters

Year:

1992

Language:

english

File:

PDF, 571 KB

english, 1992

30

Oxygen content of heavily doped silicon

Pearce, C. W., Jaccodine, R. J., Filo, A. J., Lin, W.

Journal:

Applied Physics Letters

Year:

1985

Language:

english

File:

PDF, 522 KB

english, 1985

31

An angle-resolved study of early oxidation (

S. J. Kilpatrick, R. J. Jaccodine

Year:

2008

Language:

english

File:

PDF, 985 KB

english, 2008

32

Stress effects in the oxidation of planar silicon substrates

A. Mihalyi, R. J. Jaccodine, T. J. Delph

Year:

1999

Language:

english

File:

PDF, 304 KB

english, 1999

33

Evaluation of polymeric coatings for MCM applications

R. Kodnani, D. Jaffe, R. Jaccodine

Year:

1995

Language:

english

File:

PDF, 898 KB

english, 1995

34

Role of recoil implanted oxygen in determining boron diffusion in silicon

Fan, D., Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1990

Language:

english

File:

PDF, 910 KB

english, 1990

35

STACKING FAULTS IN EPITAXIAL MATERIAL

Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1963

Language:

english

File:

PDF, 306 KB

english, 1963

36

Impurity dependence of film-edge-induced dislocations in silicon

Huang, C. K., Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1989

Language:

english

File:

PDF, 867 KB

english, 1989

37

Use of Modified Free Energy Theorems to Predict Equilibrium Growing and Etching Shapes

Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1962

Language:

english

File:

PDF, 631 KB

english, 1962

38

Doping-density dependence of scanning tunneling spectroscopy on lightly doped silicon

Lin, H.-A., Jaccodine, R., Freund, M. S.

Journal:

Applied Physics Letters

Year:

1998

Language:

english

File:

PDF, 271 KB

english, 1998

39

EXTRINSIC STACKING FAULTS IN SILICON AFTER HEATING IN WET OXYGEN

Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1966

Language:

english

File:

PDF, 404 KB

english, 1966

40

A reverse bias, tip-insulator-semiconductor tunnel diode model accounting for the delineation of a p/p[sup +] junction using scanning tunneling microscopy

Lin, Hai-An, Jaccodine, Ralph J., Freund, Michael S.

Journal:

Journal of Applied Physics

Year:

2000

Language:

english

File:

PDF, 630 KB

english, 2000

41

Enhanced tail diffusion of ion implanted boron in silicon

Fan, D., Huang, J., Jaccodine, R. J., Kahora, P., Stevie, F.

Journal:

Applied Physics Letters

Year:

1987

Language:

english

File:

PDF, 475 KB

english, 1987

42

DIFFUSION-INDUCED DISLOCATION NETWORKS IN Si

Jaccodine, R. J.

Journal:

Applied Physics Letters

Year:

1964

Language:

english

File:

PDF, 283 KB

english, 1964

43

Interaction of Diffusion and Stacking Faults in Si Epitaxial Material

Jaccodine, R. J.

Journal:

Journal of Applied Physics

Year:

1965

Language:

english

File:

PDF, 640 KB

english, 1965

44

Chemically Assisted Oxidation of Silicon Nitride

Journal:

Journal of The Electrochemical Society

Year:

1999

Language:

english

File:

PDF, 226 KB

english, 1999

45

Planar oxidation of strained silicon substrates

Lin, M-T., Jaccodine, R. J., Delph, T. J.

Journal:

Journal of Materials Research

Year:

2001

Language:

english

File:

PDF, 195 KB

english, 2001

46

Heater Cathode Breakdown

Jaccodine, R. J.

Journal:

Journal of The Electrochemical Society

Year:

1959

Language:

english

File:

PDF, 226 KB

english, 1959

47

Nodule Growth on Al[sub 2]O[sub 3] Coatings

Jaccodine, R. J.

Journal:

Journal of The Electrochemical Society

Year:

1960

Language:

english

File:

PDF, 302 KB

english, 1960

48

Submicron Oxidation Thickening

Jaccodine, R. J.

Journal:

Journal of The Electrochemical Society

Year:

1999

Language:

english

File:

PDF, 465 KB

english, 1999

49

A Study of the Ion Implanted Arsenic Tail in Silicon

Beck, S. E., Jaccodine, R. J., Filo, A. J., Irwin, R.

Journal:

MRS Proceedings

Year:

1987

Language:

english

File:

PDF, 190 KB

english, 1987

50

Effect of Recoil Implantation of Oxygen on Boron Enhanced Diffusion in Silicon

Fan, D., Jaccodine, R. J.

Journal:

MRS Proceedings

Year:

1989

Language:

english

File:

PDF, 853 KB

english, 1989